Top Wafer

Silicon Chamfering Machine

The wafer chamfering machine is specially used to process the edge of the wafer to remove sharp edges and to increase the strength of the edge so that cracks will not occur during further processing.

Silicon Chamfering Machine

Product Parameters

Customization supported?YesMinimum travel distance of vacuum disc<±0.01
Total equipment weight350kgGrinding speed1mm/s-50mm/s
External dimensions1740x840x980mmAdsorption forceBetter than -80 kPa
Grinding disc sizeCustomizableTotal power2KW
Workpiece size1-6inchMain power supply380V
Grinding wheel speedAdjustable from 0-4500rpmMain motor speed0-90rpm
Wafer center positioning accuracy≤±0.1mmTiming range99 hours and 59 minutes
Vacuum chuck repeatability≤±0.01mmWorking positionGroup 1

 

Product Features

Product Features

1. A precise control system allows for accurate setting and adjustment of parameters such as cutting speed and depth.

2. Semi-automatic operation: Only manual loading and unloading are required; the equipment can automatically perform grinding.

3. High processing precision: It can precisely control the chamfer angle, size, and surface roughness.

4. Processing various wafer sizes: It can accommodate wafers of different sizes and materials, such as 1-6 inch wafers, as well as OF wafers and rounded-edge wafers.

5. Good stability: The equipment typically uses high-quality materials and advanced manufacturing processes to ensure stable operation over long periods.

Equipment Principle

Equipment Principle

Automated wafer chamfering equipment for high precision wafer processing
A chamfer is achieved by grinding the edges of a wafer using a high-speed rotating grinding head. The wafer is placed on a vacuum chuck and fixed in place. By inputting parameters such as the wafer's dimensions, the CNC system automatically and precisely grinds the wafer edges according to preset trajectories and parameters.
FAQ

FAQ

Q1: Which cleaning methods can be used?

A: Chemical and ultrasonic cleaning can be utilized.

A: Yes it can be used in cleanroom applications.

A: Particulates, organics, and surface contamination.

A: Yes it can be set up to limit chemical usage.
 
A: Yes the cleaning process is customizable.
 
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silicon wafer production line